The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 01, 2011
Filed:
Jul. 21, 2004
Bipin S. Parekh, Chelmsford, MA (US);
Jeffrey J. Spiegelman, San Diego, CA (US);
Robert S. Zeller, Boston, MA (US);
Russell J. Holmes, Santee, CA (US);
Bipin S. Parekh, Chelmsford, MA (US);
Jeffrey J. Spiegelman, San Diego, CA (US);
Robert S. Zeller, Boston, MA (US);
Russell J. Holmes, Santee, CA (US);
Entegris, Inc., Billerica, MA (US);
Abstract
A lithographic projection apparatus () includes a support configured to support a patterning device (MA), the patterning device configured to pattern the projection beam according to a desired pattern. The apparatus has a substrate (W) table configure to hold a substrate, a projection system configured to project the patterned beam onto a target portion of the substrate. The apparatus also has a purge gas supply system () configured to provide a purge gas near a surface of a component of the lithographic projection apparatus. The purge gas supply system () includes a purge gas mixture generator () configured to generate a purge gas mixture which includes at least one purging gas and moisture. The purge gas mixture generator has a moisturizer () configured to add the moisture to the purge gas and a purge gas mixture outlet () connected to the purge gas mixture generator () configured to supply the purge gas mixture near the surface.