The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 25, 2011
Filed:
May. 23, 2006
Hareesh Thridandam, Vista, CA (US);
Manchao Xiao, San Diego, CA (US);
Xinjian Lei, Vista, CA (US);
Thomas Richard Gaffney, Carlsbad, CA (US);
Hareesh Thridandam, Vista, CA (US);
Manchao Xiao, San Diego, CA (US);
Xinjian Lei, Vista, CA (US);
Thomas Richard Gaffney, Carlsbad, CA (US);
Air Products and Chemicals, Inc., Allentown, PA (US);
Abstract
The present invention is directed to a method for depositing a silicon oxide layer on a substrate by CVD. The reaction of an organoaminosilane precursor where the alkyl group has at least two carbon atoms in the presence of an oxidizing agent allows for the formation of a silicon oxide film. The organoaminosilanes are represented by the formulas: The use of diisopropylaminosilane is the preferred precursor for the formation of the silicon oxide film.