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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7875199 B1

PDFFull Text
Date of Patent:
Jan. 25, 2011

Filed:

Nov. 09, 2004

Radical generating method, etching method and apparatus for use in these methods

Applicants:

Toshio Goto, Nisshin, JP;

Masaru Hori, Nisshin, JP;

Mikio Nagai, Komaki, JP;

Inventors:

Toshio Goto, Nisshin, JP;

Masaru Hori, Nisshin, JP;

Mikio Nagai, Komaki, JP;

Assignee:

Showa Denko K.K., Tokyo, JP;

Attorney:

Sughrue Mion, PLLC

Primary Examiner:

Rodney G McDonald

Int. Cl.
CPC ...
C23C 14/34 (2006.01); C23F 1/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

The method for generating radicals comprises:

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