The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 18, 2011

Filed:

Aug. 06, 2008
Applicants:

Takayuki Abe, Kanagawa, JP;

Tomohiro Iijima, Shizuoka, JP;

Hideo Tsuchiya, Tokyo, JP;

Tetsuyuki Arai, Kanagawa, JP;

Inventors:

Takayuki Abe, Kanagawa, JP;

Tomohiro Iijima, Shizuoka, JP;

Hideo Tsuchiya, Tokyo, JP;

Tetsuyuki Arai, Kanagawa, JP;

Assignee:

NuFlare Technology, Inc., Numazu-shi, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 21/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A pattern inspection apparatus includes a light source configured to emit a pulsed light, a stage on which an inspection target workpiece is placed, a sensor, including a plurality of light receiving elements two-dimensionally arrayed, configured to capture a pattern image in a two-dimensional region of the inspection target workpiece which is irradiated with the pulsed light, by using the plurality of light receiving elements, and a comparing unit configured to compare data of the pattern image with predetermined reference pattern image data, wherein the stage moves to be shifted by a number of pixels, being the number of natural number times one pixel, between pulses of the pulsed light.


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