The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 18, 2011

Filed:

Nov. 19, 2008
Applicant:

Roy E. Rand, Palo Alto, CA (US);

Inventor:

Roy E. Rand, Palo Alto, CA (US);

Assignee:

Telesecurity Sciences, Inc., Las Vegas, NV (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G21K 1/08 (2006.01); H01J 3/14 (2006.01); H01J 3/26 (2006.01); H01J 49/42 (2006.01);
U.S. Cl.
CPC ...
Abstract

An electron beam production and control assembly includes a vacuum chamber, a beam source, and a target. The target has an active section and an inactive section. The active section is adapted to generate x-rays when the beam impinges on the x-ray producing section. The electron beam production and control assembly also includes a focusing unit positioned along the chamber at a location intermediate the rearward end and the forward end. The focusing unit directs the beam towards the target in a converging manner to impinge on the target. The focusing unit sweeps the beam along a scanning path over the active section of the target. The focusing unit moves the beam to a retrace path on the inactive section of the target between sweeps of the scanning path to maintain ion accumulation in the beam between sweeps over the active section.


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