The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 18, 2011
Filed:
Dec. 08, 2005
Kazuyuki Ogawa, Osaka, JP;
Tetsuo Shimomura, Osaka, JP;
Atsushi Kazuno, Osaka, JP;
Yoshiyuki Nakai, Osaka, JP;
Masahiro Watanabe, Osaka, JP;
Takatoshi Yamada, Osaka, JP;
Masahiko Nakamori, Osaka, JP;
Kazuyuki Ogawa, Osaka, JP;
Tetsuo Shimomura, Osaka, JP;
Atsushi Kazuno, Osaka, JP;
Yoshiyuki Nakai, Osaka, JP;
Masahiro Watanabe, Osaka, JP;
Takatoshi Yamada, Osaka, JP;
Masahiko Nakamori, Osaka, JP;
Toyo Tire & Rubber Co., Ltd., Osaka, JP;
Abstract
It is an object of the invention to provide a polishing pad capable of high precision optical detection of an endpoint during polishing in progress and prevention of slurry leakage from between a polishing region and a light-transmitting region during the use thereof even after the polishing pad has been used for a long period. It is a second object of the invention to provide a polishing pad capable of suppression of deterioration of polishing characteristics (such as in-plane uniformity) and generation of scratches due to a difference in behavior of a polishing region and a light-transmitting region during polishing. It is a third object of the invention to provide a polishing pad having a polishing region and a light-transmitting region with a concentration of a specific metal equal to or lower than a specific value (threshold value).