The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 11, 2011

Filed:

May. 09, 2008
Applicants:

Subhrajit Bhattacharya, White Plains, NY (US);

John Darringer, Mahopac, NY (US);

Daniel L. Ostapko, Mahopac, NY (US);

Inventors:

Subhrajit Bhattacharya, White Plains, NY (US);

John Darringer, Mahopac, NY (US);

Daniel L. Ostapko, Mahopac, NY (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G06F 17/50 (2006.01);
U.S. Cl.
CPC ...
Abstract

A mask reuse methodology process in which the soft logic is implemented with a generic array type cell structure mask and a custom blocking mask. A system is provided comprising a mask set having a plurality of reusable masks corresponding to a plurality of hard intellectual property (IP) components; a generic array type cell mask; and a custom blocking mask that includes blocking regions that positionally correspond with a set of IP components printed on a die.


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