The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 11, 2011
Filed:
May. 19, 2008
Applicants:
Gek Soon Chua, Singapore, SG;
Sia Kim Tan, Singapore, SG;
Byoung-il Choi, Singapore, SG;
Ryan Chong, Singapore, SG;
Martin Yeo, Singapore, SG;
Inventors:
Gek Soon Chua, Singapore, SG;
Sia Kim Tan, Singapore, SG;
Byoung-IL Choi, Singapore, SG;
Ryan Chong, Singapore, SG;
Martin Yeo, Singapore, SG;
Assignee:
Chartered Semiconductor Manufacturing Ltd., Singapore, SG;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03C 5/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A reticle system that includes: providing a reticle system; and assigning two or more of an image pattern onto the reticle system to form one or more layers of an integrated circuit system by grouping and pairing each of the image pattern onto the reticle system according to a multi-layer reticle grouping/pairing flow.