The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 11, 2011

Filed:

Sep. 27, 2007
Applicants:

Toshiaki Douzaka, Kanagawa-ken, JP;

Kyosuke Ogawa, Kanagawa-ken, JP;

Kaoru Hama, Kanagawa-ken, JP;

Hiroaki Suzuki, Kanagawa-ken, JP;

Inventors:

Toshiaki Douzaka, Kanagawa-ken, JP;

Kyosuke Ogawa, Kanagawa-ken, JP;

Kaoru Hama, Kanagawa-ken, JP;

Hiroaki Suzuki, Kanagawa-ken, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 1/08 (2006.01); G03F 1/14 (2006.01);
U.S. Cl.
CPC ...
Abstract

A photo-mask that includes a first light shielding region which is narrow and elongated, and a second light shielding region which is wider and more elongated than the first light shielding region and is away from the first light shielding region. A phase shifter part and a non-phase shifter part are provided adjacently to both sides of the first light shielding region. Two phase shifter parts or two non-phase shifter parts are respectively provided adjacently to both sides of the second light shielding part.


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