The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 28, 2010
Filed:
Jan. 07, 2005
Applicants:
Suk Hwan Lim, Mountain View, CA (US);
Jonathan Yen, San Jose, CA (US);
Inventors:
Suk Hwan Lim, Mountain View, CA (US);
Jonathan Yen, San Jose, CA (US);
Assignee:
Hewlett-Packard Development Company, L.P., Houston, TX (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06K 9/36 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method for determining an indication of how well-focused an image is. An image is divided into a plurality of blocks. At least one local measure is determined for at least one block of the plurality of blocks. At least one global figure-of-merit is determined for the image based on the local measure. An indication of focus is determined based on the global figure-of-merit.