The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 28, 2010
Filed:
Dec. 04, 2007
Harald Baumann, Osterode/Harz, DE;
Udo Dwars, Herzberg/Harz, DE;
Bernd Strehmel, Berlin, DE;
Christopher D. Simpson, Osterode, DE;
Celin Savariar-hauck, Badenhausen, DE;
Gerhard Hauck, Badenhausen, DE;
Harald Baumann, Osterode/Harz, DE;
Udo Dwars, Herzberg/Harz, DE;
Bernd Strehmel, Berlin, DE;
Christopher D. Simpson, Osterode, DE;
Celin Savariar-Hauck, Badenhausen, DE;
Gerhard Hauck, Badenhausen, DE;
Eastman Kodak Company, Rochester, NY (US);
Abstract
Radiation-sensitive compositions and imageable elements include a polymeric or non-polymeric component in an imageable layer, which component includes 1H-tetrazole groups. The non-polymeric components can be radically polymerizable compounds. The polymeric components can have 1H-tetrazole groups that are pendant to the backbone. The use of such components in negative- or positive-working imageable elements provides high photospeed and improved developability for providing imaged and developed elements, such as lithographic printing plates that show improved chemical resistance and run length.