The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 28, 2010
Filed:
Apr. 16, 2008
Naomu Kitano, Ichikawa, JP;
Naoki Yamada, Fuchu, JP;
Takaaki Tsunoda, Kessel-Lo, BE;
Nobuo Yamaguchi, Tama, JP;
Motomu Kosuda, Machida, JP;
Naomu Kitano, Ichikawa, JP;
Naoki Yamada, Fuchu, JP;
Takaaki Tsunoda, Kessel-Lo, BE;
Nobuo Yamaguchi, Tama, JP;
Motomu Kosuda, Machida, JP;
Canon Anelva Corporation, Kawasaki-shi, JP;
Abstract
A sputtering film forming method. which positions a targetandat an incline to a surface of a substratewhereupon a film is to be formed, and forms the film upon the surface of the substratewhereupon the film is to be formed in an incline direction while the substrateis rotated about a normal axis, terminates the forming of the film at a predetermined timing from the commencement of the forming of the film, wherein the forming of the film is terminated, when the substrate has rotated by 360 degrees×n+180 degrees+α, where n is a natural number, including 0, and −10 degrees<α<10 degrees.