The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 21, 2010

Filed:

Sep. 28, 2007
Applicants:

P. Jeffrey Ungar, Sunnyvale, CA (US);

Ilhami H. Torunoglu, Monte Sereno, CA (US);

Inventors:

P. Jeffrey Ungar, Sunnyvale, CA (US);

Ilhami H. Torunoglu, Monte Sereno, CA (US);

Assignee:

Gauda, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 17/50 (2006.01); G06F 19/00 (2006.01); G06F 17/14 (2006.01); G03F 1/00 (2006.01); G21K 5/00 (2006.01); G06K 9/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

In an electronic design automation technique for optical proximity correction, a mask is represented by a function with an exact analytical form over a mask region. Using the physics of optical projection, a solution based on a spatial frequency analysis is determined. Spatial frequencies above a cutoff are determined by the optical system do not contribute to the projected image. Spatial frequencies below this cutoff affect the print (and the mask), while those above the cutoff only affect the mask. Frequency components in the function below this cutoff frequency may be removed, which will help to reduce computational complexity.


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