The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 21, 2010
Filed:
Aug. 14, 2007
Ivar Schram, Weert, NL;
Johan Frederik Dijksman, Weert, NL;
Sander Frederik Wuister, Eindhoven, NL;
Yvonne Wendela Kruijt-stegeman, Eindhoven, NL;
Jeroen Herman Lammers, Eindhoven, NL;
Richard Joseph Marinus Schroeders, Eindhoven, NL;
Ivar Schram, Weert, NL;
Johan Frederik Dijksman, Weert, NL;
Sander Frederik Wuister, Eindhoven, NL;
Yvonne Wendela Kruijt-Stegeman, Eindhoven, NL;
Jeroen Herman Lammers, Eindhoven, NL;
Richard Joseph Marinus Schroeders, Eindhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
An imprint lithography method is disclosed, which includes imprinting a plurality of patterns in an imprintable medium provided on a substrate, wherein the order in which the patterns are imprinted in the imprintable medium is such that, for the majority of the patterns, two consecutively imprinted patterns are not imprinted adjacent to one another.