The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7851287 B1

PDF
Full Text
Expired
Date of Patent:
Dec. 14, 2010

Filed:

Apr. 13, 2010
Applicants:

Sung-min Kim, Incheon, KR;

Eun-jung Yun, Seoul, KR;

Dong-won Kim, Seongnam-si, KR;

Inventors:

Sung-Min Kim, Incheon, KR;

Eun-Jung Yun, Seoul, KR;

Dong-Won Kim, Seongnam-si, KR;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/336 (2006.01);
U.S. Cl.
CPC ...
Abstract

A Schottky barrier FinFET device and a method of fabricating the same are provided. The device includes a lower fin body provided on a substrate. An upper fin body having first and second sidewalls which extend upwardly from a center of the lower fin body and face each other is provided. A gate structure crossing over the upper fin body and covering an upper surface of the upper fin body and the first and second sidewalls is provided. The Schottky barrier FinFET device includes a source and a drain which are formed on the sidewalls of the upper fin body adjacent to sidewalls of the gate structure and made of a metal material layer formed on an upper surface of the lower fin body positioned at both sides of the upper fin body, and the source and drain form a Schottky barrier to the lower and upper fin bodies.


Find Patent Forward Citations

Kim, Sung-Min. (2010). Method of fabricating schottky barrier finfet device (U.S. Patent No. 7851287). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7851287

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