The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 14, 2010
Filed:
Nov. 29, 2006
Masataka Nunomura, Ibaraki, JP;
Masayuki Ooe, Ibaraki, JP;
Hajime Nakano, Ibaraki, JP;
Yoshiko Tsumaru, Ibaraki, JP;
Takumi Ueno, Ibaraki, JP;
Masataka Nunomura, Ibaraki, JP;
Masayuki Ooe, Ibaraki, JP;
Hajime Nakano, Ibaraki, JP;
Yoshiko Tsumaru, Ibaraki, JP;
Takumi Ueno, Ibaraki, JP;
Hitachi Chemical Dupont Microsystems Ltd., Tokyo, JP;
Hitachi Chemical Dupont Microsystems L.L.C., Wilmington, DE (US);
Abstract
A photosensitive polymer composition, having (a) a polymer selected from polyimide precursors and polyimides having an acid group protected by a protecting group and having no amino group (—NH) at the end; and (b) a compound that generates an acid when exposed to light and capable of deprotecting the protecting group from the acid group, is employed to form layers of a semiconductor device.