The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7851121 B1

PDF
Full Text
Expired
Date of Patent:
Dec. 14, 2010

Filed:

Feb. 10, 2006
Applicants:

Kazuhiro Yamanaka, Tokyo, JP;

Michael Romeo, Atlanta, GA (US);

Clifford Henderson, Atlanta, GA (US);

Kazuhiko Maeda, Tokyo, JP;

Inventors:

Kazuhiro Yamanaka, Tokyo, JP;

Michael Romeo, Atlanta, GA (US);

Clifford Henderson, Atlanta, GA (US);

Kazuhiko Maeda, Tokyo, JP;

Assignees:

Central Glass Co., Ltd., Ube-shi, Yamaguchi, JP;

Georgia Tech Research Corporation, Atlanta, GA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 7/023 (2006.01);
U.S. Cl.
CPC ...
Abstract

There is provided a photosensitive composition including a polyimide or polyimide precursor. The polyimide and polyimide precursor of the present invention includes a group of a first acid-cleavable group, a first base-cleavable group or a first thermally-cleavable group, and another group of a hydrophilic group, or a protected hydrophilic group by a second acid-cleavable group, a second base-cleavable group, or a crosslinkable group.


Find Patent Forward Citations

Yamanaka, Kazuhiro. (2010). Photosensitive polyimide composition and polyimide precursor composition (U.S. Patent No. 7851121). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7851121

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…