The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 07, 2010
Filed:
Jun. 29, 2007
Mark G. Stinson, Wood River, IL (US);
Madhavan S. Esayanur, St. Peters, MO (US);
Dennis Buese, O'Fallon, MO (US);
Emanuele Corsi, Novara, IT;
Ezio Bovio, Bellinzago Novarese, IT;
Antonio Maria Rinaldi, Novara, IT;
Larry Flannery, Warrenton, MO (US);
Mark G. Stinson, Wood River, IL (US);
Madhavan S. Esayanur, St. Peters, MO (US);
Dennis Buese, O'Fallon, MO (US);
Emanuele Corsi, Novara, IT;
Ezio Bovio, Bellinzago Novarese, IT;
Antonio Maria Rinaldi, Novara, IT;
Larry Flannery, Warrenton, MO (US);
MEMC Electronic Materials, Inc., St. Peters, MO (US);
Abstract
A dressing apparatus for dressing a polishing pad includes a dressing member engageable with the polishing pad. The dressing apparatus is adapted to change the amount of force exerted by the dressing member on the polishing pad as the dressing member moves radially along the polishing pad. A controller for controlling the dressing apparatus has pre-programmed recipes that are selectable based on the radial profile of a measured polished wafer.