The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 16, 2010
Filed:
Dec. 22, 2004
Theodorus Marinus Modderman, Nuenen, NL;
Nicolaas Antonius Allegondus Johannes Van Asten, Breda, NL;
Johan Maria Van Boxmeer, Sint Oedenrode, NL;
Gerrit Johannes Nijmeijer, Eindhoven, NL;
Theodorus Marinus Modderman, Nuenen, NL;
Nicolaas Antonius Allegondus Johannes Van Asten, Breda, NL;
Johan Maria Van Boxmeer, Sint Oedenrode, NL;
Gerrit Johannes Nijmeijer, Eindhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A method of exposing a substrate (e.g. in a lithographic apparatus comprising a substrate table to support a substrate) according to one embodiment of the invention includes performing first and a second height measurement of a part of at least one substrate with a first and second sensor, generating and storing an offset error map based on a difference between the measurements; generating and storing a height map of portions of the substrate (or another substrate that has had a similar processing as the part) by performing height measurements with the first sensor and correcting this height map by means of the offset error map; and exposing the substrate (or the other substrate).