The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 16, 2010
Filed:
Oct. 21, 2008
William A. Bagley, Tokyo, JP;
Paohuei Lee, San Jose, CA (US);
Kyung-tae Kim, Suwon, KR;
Sam-kyung Kim, Kumi, KR;
Toshio Kiyotake, Hyogo, JP;
Sam Kim, San Ramon, CA (US);
Takayuki Matsumoto, Santa Clara, CA (US);
Jonathan Erik Larson, East Palo Alto, CA (US);
Makoto Inagawa, Palo Alto, CA (US);
James Hoffman, San Jose, CA (US);
Billy C. Leung, Fremont, CA (US);
William A. Bagley, Tokyo, JP;
Paohuei Lee, San Jose, CA (US);
Kyung-Tae Kim, Suwon, KR;
Sam-Kyung Kim, Kumi, KR;
Toshio Kiyotake, Hyogo, JP;
Sam Kim, San Ramon, CA (US);
Takayuki Matsumoto, Santa Clara, CA (US);
Jonathan Erik Larson, East Palo Alto, CA (US);
Makoto Inagawa, Palo Alto, CA (US);
James Hoffman, San Jose, CA (US);
Billy C. Leung, Fremont, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
An apparatus and method incorporating at least two sensors that detect the presence of a substrate is provided. In one embodiment, a method for transferring a substrate in a processing system is described. The method includes positioning a substrate on an end effector in a first chamber, moving the substrate through an opening between the first chamber and a second chamber along a substrate travel path, and sensing opposing sides of the substrate travel path using at least two sensors positioned proximate to the opening, each of the at least two sensors defining a beam path that is directed through opposing edge regions of the substrate when at least a portion of an edge region traverses the beam path.