The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 16, 2010
Filed:
Dec. 21, 2006
Johannes Jacobus Matheus Baselmans, Oirschot, NL;
Andrey S. Tychkov, Veldhoven, NL;
Johannes Jacobus Matheus Baselmans, Oirschot, NL;
Andrey S. Tychkov, Veldhoven, NL;
ASML Netherlands B. V., Veldhoven, NL;
Abstract
A method of lithography is disclosed that includes conditioning a radiation beam using an illumination system of a lithographic apparatus, imparting the radiation beam with a pattern in its cross-section, and projecting the patterned beam of radiation as an exposure field onto a substrate, wherein a periodic interference pattern is present in the exposure field, and relative motion is established between the substrate and a component in the illumination system, such that the periodic interference pattern is displaced in a direction which is not parallel to a direction of repetition of the periodic interference pattern.