The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 09, 2010
Filed:
Jan. 16, 2007
Hilmar Gugel, Dossenheim, DE;
Marcus Dyba, Mannheim, DE;
Volker Seyfried, Nussloch, DE;
Leica Microsystems CMS GmbH, Wetzlar, DE;
Abstract
A method for high spatial resolution examination of a sample, the sample to be examined including a substance that can be repeatedly converted from a first state into a second state, the first and the second states differing from one another in at least one optical property. The method includes: a) bringing the substance into the first state by means of a switching signal in a sample region to be recorded, b)inducing the second state by means of an optical signal, spatially delimited subregions being specifically excluded within the sample region to be recorded, c) reading out the remaining first states, and d) steps a) to c) are repeated, the optical signal being displaced upon each repetition in order to scan the sample, wherein the individual steps a) to d) are carried out in a sequence adapted to the respective measuring situation.