The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 09, 2010
Filed:
Mar. 05, 2007
Applicants:
Marcus Adrianus Van DE Kerkhof, Helmond, NL;
M'hamed Akhssay, Helmond, NL;
Mamoun El Ouasdad, Culemborg, NL;
Asis Uasghiri, Rotterdam, NL;
Inventors:
Marcus Adrianus Van De Kerkhof, Helmond, NL;
M'hamed Akhssay, Helmond, NL;
Mamoun El Ouasdad, Culemborg, NL;
Asis Uasghiri, Rotterdam, NL;
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Primary Examiner:
Int. Cl.
CPC ...
G03F 9/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
In a device manufacturing method using a lithographic apparatus, corrections to the dose are applied, within and/or between fields, to compensate for CD variations due to heating of elements of the projection system of the lithographic apparatus.
Van De Kerkhof, Marcus. (2010). Device manufacturing method, computer program and lithographic apparatus (U.S. Patent No. 7829249). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7829249
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile