The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 09, 2010
Filed:
Apr. 29, 2008
Masanobu Hatanaka, Shizuoka-ken, JP;
Michio Ishikawa, Shizuoka-ken, JP;
Se-ju Lim, Shizuoka-ken, JP;
Fumio Nakamura, Shizuoka-ken, JP;
Masanobu Hatanaka, Shizuoka-ken, JP;
Michio Ishikawa, Shizuoka-ken, JP;
Se-Ju Lim, Shizuoka-ken, JP;
Fumio Nakamura, Shizuoka-ken, JP;
ULVAC, Inc., Kanagawa-ken, JP;
Abstract
A vacuum film-forming apparatus comprising substrate stages; vacuum chamber-forming containers opposed to the stages; a means for moving the substrate between the stages; and gas-introduction means connected to every containers, wherein one of the stage and the container is ascended or descended towards the other to bring the upper face of the stage and the opening of the container into contact with one another so that vacuum chambers can be formed and that a raw gas and/or a reactant gas can be introduced into each space of the chamber through each gas-introduction means to carry out either the adsorption or reaction step for allowing the raw gas to react with the reactant gas. The apparatus permits the independent establishment of process conditions for the adsorption and reaction processes and the better acceleration of the reaction between raw and reactant gases to give a film having excellent quality and the apparatus can be manufactured at a low cost.