The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 02, 2010
Filed:
Aug. 17, 2006
Joseph K. V. Comeau, Essex Junction, VT (US);
Marina M. Katsnelson, Burlington, VT (US);
Matthew T. Tiersch, Essex Junction, VT (US);
Eric J. White, Charlotte, VT (US);
Joseph K. V. Comeau, Essex Junction, VT (US);
Marina M. Katsnelson, Burlington, VT (US);
Matthew T. Tiersch, Essex Junction, VT (US);
Eric J. White, Charlotte, VT (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A solution for forming a polishing slurry, the polishing slurry and related methods are disclosed. The solution for forming a polishing slurry may include 1H-benzotriazole (BTA) dissolved in an ionic surfactant such as a sodium alkyl sulfate solution, and perhaps a polyacrylic acid (PAA) solution. The solution can be filtered and used in a polishing slurry. This approach to solubilizing BTA results in a high BTA concentration in a polishing slurry without addition of foreign components to the slurry or increased safety hazard. In addition, the solution is easier to ship because it is very stable (e.g., can be frozen and thawed) and has less volume compared to conventional approaches. Further, the polishing slurry performance is vastly improved due to the removal of particles that can cause scratching.