The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 26, 2010

Filed:

Nov. 03, 2005
Applicants:

Martin Knaipp, Unterpremstätten, AT;

Rainer Minixhofer, Unterpremstätten, AT;

Martin Schrems, Eggersdorf, AT;

Inventors:

Martin Knaipp, Unterpremstätten, AT;

Rainer Minixhofer, Unterpremstätten, AT;

Martin Schrems, Eggersdorf, AT;

Assignee:

Austriamicrosystems AG, Unterpremstättan, AT;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

In order to produce doping regions (DG) in a substrate (S) having different dopings with the aid of a single mask (DM) different mask regions are provided which have elongated mask openings (MO) having different orientations relative to the spatial direction of an oblique implantation. The substrate is rotated between the first and second oblique implantations, wherein during the first oblique implantation maximum and minimum shadings in the different mask regions are opposite one another and the conditions are precisely reversed during the second oblique implantation after the rotation of the substrate.


Find Patent Forward Citations

Loading…