The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 26, 2010
Filed:
Mar. 11, 2009
Tadahiro Ohmi, Sendai-shi, Miyagi, 9803-0813, JP;
Masaki Hirayama, Miyagi, JP;
Tadahiro Ohmi, Sendai-shi, Miyagi, 9803-0813, JP;
Masaki Hirayama, Miyagi, JP;
Other;
Tokyo Electron Limited, Tokyo, JP;
Abstract
In a microwave plasma processing apparatus, a metal made lattice-like shower plateis provided between a dielectric material shower plate, and a plasma excitation gas mainly an inert gas and a process gas are discharged form different locations. High energy ions can be incident on a surface of the substrateby grounding the lattice-like shower plate. The thickness of each of the dielectric material separation walland the dielectric material at a microwave introducing part is optimized so as to maximize the plasma excitation efficiency, and, at the same time, the distance between the slot antennaand the dielectric material separation walland a thickness of the dielectric material shower plateare optimized so as to be capable of supplying a microwave having a large power.