The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 12, 2010
Filed:
Oct. 27, 2005
Shinji Kurita, Hitachiota, JP;
Norio Kawamura, Hitachinaka, JP;
Masahiro Takeuchi, Tokyo, JP;
Hitachi High-Tech Science Systems Corporation, Hitachinaka-shi, JP;
Abstract
It is intended to realize measuring of trace organic components and to render qualitative procedure efficient through imparting of selectivity. Penning gas and dopant gas are ionized in a space isolated from discharge part with the use of metastable helium obtained by direct-current glow discharge, and with the use of thus obtained plasma, the efficiency of ionization of components to be measured is enhanced, so that intensified ion current can be obtained. Further, through selection of dopant gas and Penning gas, selectivity can be imparted. Thus, not only can measuring of trace organic components be performed but also selectivity can be imparted.