The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7811866 B1

PDF
Full Text
Expired
Date of Patent:
Oct. 12, 2010

Filed:

Mar. 27, 2006
Applicants:

Hao-yi Tsai, Hsin-Chu, TW;

Shang-yun Hou, Jubei, TW;

Anbiarshy N. F. Wu, Chiayi, TW;

Chia-lun Tsai, Hsinchu, TW;

Shin-puu Jeng, Hsin-Chu, TW;

Inventors:

Hao-Yi Tsai, Hsin-Chu, TW;

Shang-Yun Hou, Jubei, TW;

Anbiarshy N. F. Wu, Chiayi, TW;

Chia-Lun Tsai, Hsinchu, TW;

Shin-Puu Jeng, Hsin-Chu, TW;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/82 (2006.01);
U.S. Cl.
CPC ...
Abstract

An integrated circuit structure comprising a fuse and a method for forming the same are provided. The integrated circuit structure includes a substrate, an interconnection structure over the substrate, a fuse connected to the interconnection structure, and an anti-reflective coating (ARC) on the fuse. The ARC has an increased thickness and acts as a remaining oxide, and no further remaining passivation layer exists on the ARC.


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Tsai, Hao-Yi. (2010). Single passivation layer scheme for forming a fuse (U.S. Patent No. 7811866). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7811866

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