The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 12, 2010

Filed:

Aug. 16, 2005
Applicants:

Carl Woods, Aptos, CA (US);

Jeffrey J. Farber, Delmar, NY (US);

Inventors:

Carl Woods, Aptos, CA (US);

Jeffrey J. Farber, Delmar, NY (US);

Assignee:

Lam Research Corporation, Fremont, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C25D 21/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

An apparatus for processing a substrate is provided. The apparatus includes a plating head configured to plate a surface of the substrate with a layer of a material using a fluid meniscus between the plating head and a surface of the substrate. The apparatus also includes a fluid meniscus stabilizing apparatus configured to apply a pre-processing fluid to the surface of the substrate before the fluid meniscus is applied to the surface.


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Woods, Carl. (2010). Reducing mechanical resonance and improved distribution of fluids in small volume processing of semiconductor materials (U.S. Patent No. 7811424). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7811424

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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