The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 05, 2010
Filed:
Feb. 01, 2008
Applicants:
Arjen B. Storm, Delft, NL;
Robertus W. W. Hooft, Gravenzande, NL;
Leendert J. Seijbel, Rotterdam, NL;
Inventors:
Arjen B. Storm, Delft, NL;
Robertus W. W. Hooft, Gravenzande, NL;
Leendert J. Seijbel, Rotterdam, NL;
Assignee:
Bruker AXS, Inc., Madison, WI (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G21K 1/06 (2006.01);
U.S. Cl.
CPC ...
Abstract
In an X-ray diffraction apparatus, a high brightness source, such as a rotating anode generator, is combined with demagnification X-ray optics to produce a beam with small image size and high-intensity. In one embodiment, an elliptical X-ray optic is positioned relative to the source and image focal points so that the magnification of the optic is less than one. The combination can produce high-intensity beams with beam images at the sample of less than 0.1 mm.