The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 05, 2010
Filed:
Oct. 15, 2008
Applicants:
Tomohiro Kobayashi, Joetsu, JP;
Takeshi Kinsho, Joetsu, JP;
Takeru Watanabe, Joetsu, JP;
Tadahiro Sunaga, Sodegaura, JP;
Yuichi Okawa, Sodegaura, JP;
Inventors:
Tomohiro Kobayashi, Joetsu, JP;
Takeshi Kinsho, Joetsu, JP;
Takeru Watanabe, Joetsu, JP;
Tadahiro Sunaga, Sodegaura, JP;
Yuichi Okawa, Sodegaura, JP;
Assignees:
Shin-Etsu Chemical Co., Ltd., Tokyo, JP;
Mitsui Chemicals, Inc., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 7/30 (2006.01); C08F 232/08 (2006.01);
U.S. Cl.
CPC ...
Abstract
Resist compositions comprising a hydrogenated ring-opening metathesis polymer bearing an alicyclic structure in its backbone and comprising structural units having an oxygen atom incorporated as part of the cyclic structure exhibit a high resolution and minimal proximity bias upon ArF excimer laser lithography and have high etching resistance.