The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 05, 2010
Filed:
Feb. 26, 2003
Akira Kuibira, Itami, JP;
Masuhiro Natsuhara, Itami, JP;
Hirohiko Nakata, Itami, JP;
Sumitomo Electric Industries, Ltd., Osaka, JP;
Abstract
An apparatus for manufacturing a semiconductor or liquid crystal has, within a reaction chamberto which a reactive gas is supplied, a ceramic holderhaving a resistive heating elementembedded therein; and further comprises a ceramic cylindrical support memberone end of which supports the ceramic holderand the other end of which is fixed to a portion of the reaction chamber, and an inert gas supply tubeand inert gas evacuation tubeeach having an opening inside the cylindrical support member. It is preferable that the inert gas within the cylindrical support memberbe maintained at less than 0.1 MPa (one atmosphere). By means of such an arrangement, oxidation and corrosion of electrodes provided on the rear surface of the ceramic holder can be prevented, without an oxidation-resistant seal or corrosion-resistant seal being applied. The semiconductor or liquid crystal manufacturing apparatus also ensures the thermal uniformity in the ceramic holder and eliminates useless power consumption. Moreover, the apparatus size can be reduced, and manufacturing costs can be decreased.