The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 05, 2010
Filed:
Aug. 18, 2004
Applicants:
Tony P. Chiang, Santa Clara, CA (US);
Karl F. Leeser, Sunnyvale, CA (US);
Jeffrey A. Brown, San Francisco, CA (US);
Jason E. Babcoke, Menlo Park, CA (US);
Inventors:
Tony P. Chiang, Santa Clara, CA (US);
Karl F. Leeser, Sunnyvale, CA (US);
Jeffrey A. Brown, San Francisco, CA (US);
Jason E. Babcoke, Menlo Park, CA (US);
Assignee:
Novellus Systems, Inc., San Jose, CA (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01); C23C 16/00 (2006.01); C23C 14/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A deposition system includes a process chamber for conducting an ALD process to deposit layers on a substrate. An electrostatic chuck (ESC) retains the substrate. A backside gas increases thermal coupling between the substrate and the ESC. The ESC is cooled via a coolant flowing through a coolant plate and heated via a resistive heater. Various arrangements are disclosed.