The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 28, 2010
Filed:
Jan. 31, 2007
Applicants:
Ting Chen, Chandler, AZ (US);
Jang Fung Chen, Cupertino, CA (US);
Inventors:
Ting Chen, Chandler, AZ (US);
Jang Fung Chen, Cupertino, CA (US);
Assignee:
ASML Masktools B.V., , NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 5/18 (2006.01); G02B 27/42 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method of determining diffractive optical elements to be utilized in an imaging process. The method includes the steps of defining a customized diffractive optical element which is based on a target pattern to be printed during the imaging process; decomposing the customized diffractive optical element into one or more standard diffractive optical elements; and defining an exposure dose to be assigned to each of the one or more standard diffractive optical elements.