The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 28, 2010
Filed:
Mar. 29, 2007
Ji-hye Kim, Anyang-si, KR;
Yu-sin Yang, Seoul, KR;
Jong-an Kim, Seoul, KR;
Moon-shik Kang, Yongin-si, KR;
Ji-young Shin, Seoul, KR;
Ji-Hye Kim, Anyang-si, KR;
Yu-Sin Yang, Seoul, KR;
Jong-An Kim, Seoul, KR;
Moon-Shik Kang, Yongin-si, KR;
Ji-Young Shin, Seoul, KR;
Samsung Electronics Co., Ltd, Suwon-Si, KR;
Abstract
A wafer inspecting method including the steps of: multi-scanning a pattern image of a unit inspection region in a normal state and a pattern image of a unit inspection region to be inspected, respectively, using different inspection conditions; comparing the multi-scanned pattern images in the normal state with the multi-scanned pattern images to be inspected obtained by the same inspection conditions, and storing differences between the pattern images as difference images; generating a discrimination difference image by calculating a balance between the stored difference images; and discriminating a defect from noise by using the discrimination difference image.