The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 28, 2010
Filed:
Apr. 30, 2007
Hiroshi Morioka, Kanagawa, JP;
Hiroshi Morioka, Kanagawa, JP;
Fujitsu Semiconductor Limited, Yokohama, JP;
Abstract
A method for forming a pattern includes the steps of: (a) preparing a lower hard mask layer and an upper hard mask layer stacked on an etching target film; (b) forming a resist pattern above the upper hard mask layer; (c) etching the upper hard mask film by using the resist pattern as an etching mask to form an upper hard mask; (d) after the step (c), removing the resist pattern; (e) after the step (d), thinning the upper hard mask by etching; (f) etching the lower hard mask film by using the thinned upper hard mask as an etching mask to form a lower hard mask; and (g) etching the etching target film by using the upper hard mask and the lower hard mask as an etching mask. The method for forming a pattern can etch a fine pattern with good yield.