The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 21, 2010
Filed:
Aug. 13, 2008
Hideo Toraya, Tachikawa, JP;
Hideo Toraya, Tachikawa, JP;
Rigaku Corporation, Akishima-shi, JP;
Abstract
In an X-ray diffraction method using the parallel beam method, an X-ray parallel beam is incident on a sample, and diffracted X-rays from the sample are reflected at a mirror and thereafter detected by an X-ray detector. The reflective surface of the mirror has a shape of an equiangular spiral that has a center located on the surface of the sample. A crystal lattice plane that causes reflection is parallel to the reflective surface at any point on the reflective surface. The X-ray detector is one-dimensional position sensitive in a plane parallel to the diffraction plane. A relative positional relationship between the mirror and the X-ray detector is determined so that reflected X-rays from different points on the reflective surface of the mirror reach different points on the X-ray detector respectively. This X-ray diffraction method is superior in angular resolution, and is small in X-ray intensity reduction, and is simple in structure.