The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 21, 2010
Filed:
Apr. 13, 2006
Hiroaki Niimi, Dallas, TX (US);
Reima Tapani Laaksonen, Dallas, TX (US);
Hiroaki Niimi, Dallas, TX (US);
Reima Tapani Laaksonen, Dallas, TX (US);
Texas Instruments Incorporated, Dallas, TX (US);
Abstract
The present invention provides a method for manufacturing a semiconductor device. The method, in one embodiment, includes forming a silicon oxide masking layer over a substrate in a first active region and a second active region of a semiconductor device, patterning the silicon oxide masking layer to expose the substrate in the first active region. The method further includes forming a layer of dielectric material over the substrate in the first active region, the patterned silicon oxide masking layer protecting the substrate from the layer of dielectric material in the second active region.