The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 14, 2010

Filed:

Jul. 18, 2007
Applicants:

Kenichi Nagae, Kawasaki, JP;

Masatoshi Kanamaru, Inashiki-gun, JP;

Inventors:

Kenichi Nagae, Kawasaki, JP;

Masatoshi Kanamaru, Inashiki-gun, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G21K 1/087 (2006.01);
U.S. Cl.
CPC ...
Abstract

A deflector array in which a plurality of deflectors, which deflect charged particle beams, are arrayed on a substrate. The plurality of deflectors include respective openings different from each other formed on the substrate. Each of the plurality of deflectors includes a pair of electrodes opposing each other through a corresponding opening, and the plurality of deflectors are arrayed such that a length of the pair of electrodes in a longitudinal direction thereof is not less than a distance between centers of two of the plurality of deflectors which are located nearest to each other.


Find Patent Forward Citations

Nagae, Kenichi. (2010). Deflector array, exposure apparatus, and device manufacturing method (U.S. Patent No. 7795597). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7795597

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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