The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 14, 2010
Filed:
Sep. 25, 2007
Tadahiro Sunaga, Yamato, JP;
Yuichi Okawa, Ichihara, JP;
Takeshi Kinsho, Joetsu, JP;
Tomohiro Kobayashi, Joetsu, JP;
Tadahiro Sunaga, Yamato, JP;
Yuichi Okawa, Ichihara, JP;
Takeshi Kinsho, Joetsu, JP;
Tomohiro Kobayashi, Joetsu, JP;
Mitsui Chemicals, Inc., Manato-Ku, Tokyo, JP;
Shin-Etsu Chemical Co., Ltd., Chiyoda-Ku, Tokyo, JP;
Abstract
Provided is a resin having an alicyclic structure in a main chain, which is excellent in etching resistance and developing property, a resist composition for exposure with a high energy radiation using the resin, and a method for forming a pattern using the resist composition. Also provided is a hydrogenated ring-opening metathesis polymer which is comprised of alicyclic skeleton-containing structural units [A], [B] and a structural unit [C] selected from the following general formula [5] and/or [6]: wherein, e and f represent respectively an integer of 0 to 3, wherein the at least one of Xof the general formula [1] of the structural unit [A], Xof the general formula [3] and Xof the general formula [4] of the structural unit [B] is —O—, and wherein the molar ratio of the structural units [A], [B] and [C] satisfies simultaneously that [A]/([B]+[C]) is from 20/80 to 98/2, ([A]+[B])/[C] is from 99/1 to 50/50, and ([A]+[C])/[B] is from 99/1 to 21/79. Also, a resist composition comprising the same and a method for forming a pattern are provided.