The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 14, 2010
Filed:
Mar. 02, 2005
Toshiya Kotani, Machida, JP;
Satoshi Tanaka, Kawasaki, JP;
Shigeki Nojima, Yokohama, JP;
Koji Hashimoto, Yokohama, JP;
Soichi Inoue, Yokohama, JP;
Toshiya Kotani, Machida, JP;
Satoshi Tanaka, Kawasaki, JP;
Shigeki Nojima, Yokohama, JP;
Koji Hashimoto, Yokohama, JP;
Soichi Inoue, Yokohama, JP;
Kabushiki Kaisha Toshiba, Tokyo, JP;
Abstract
A pattern correcting method for correcting a design pattern to form a desired pattern on a wafer is disclosed, which comprises defining an allowable dimensional change quantity of each of design patterns, defining a pattern correction condition for the each design pattern based on the allowable dimensional change quantity defined for the each design pattern, and correcting the each design pattern based on the pattern correction condition defined for the each design pattern.