The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 14, 2010
Filed:
Mar. 19, 2007
Byeoung-ju Ha, Yongin-si, KR;
Yun-kwon Park, Dongducheon-si, KR;
In-sang Song, Seoul, KR;
Il-jong Song, Suwon-si, KR;
Jong-seok Kim, Gyeonggi-do, KR;
Duck-hwan Kim, Seoul, KR;
Jun-sik Hwang, Ohsan-si, KR;
Byeoung-ju Ha, Yongin-si, KR;
Yun-kwon Park, Dongducheon-si, KR;
In-sang Song, Seoul, KR;
Il-jong Song, Suwon-si, KR;
Jong-seok Kim, Gyeonggi-do, KR;
Duck-hwan Kim, Seoul, KR;
Jun-sik Hwang, Ohsan-si, KR;
Samsung Electronics Co., Ltd., Suwon-si, KR;
Abstract
A film bulk acoustic resonator, and a method for manufacturing the same. The film bulk acoustic resonator includes a substrate, a protection layer vapor-deposited on the substrate, a membrane vapor-deposited on the protection layer and at a predetermined distance from an upper side of the substrate, and a laminated resonance part vapor-deposited on the membrane. Further, the manufacturing method includes vapor-depositing a membrane on a substrate, forming protection layers on both sides of the membrane, vapor-depositing a laminated resonance part on the membrane, and forming an air gap by removing a part of the substrate disposed between the protection layers. Accordingly, the membrane can be formed in a simple structure and without stress, and the whole manufacturing process is simplified.