The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 07, 2010
Filed:
Jul. 10, 2006
Mark J. Williamson, Boise, ID (US);
Paul M. Johnson, Boise, ID (US);
Shawn D. Lyonsmith, Boise, ID (US);
Gurtej S. Sandhu, Boise, ID (US);
Justin R. Arrington, Boise, ID (US);
Mark J. Williamson, Boise, ID (US);
Paul M. Johnson, Boise, ID (US);
Shawn D. Lyonsmith, Boise, ID (US);
Gurtej S. Sandhu, Boise, ID (US);
Justin R. Arrington, Boise, ID (US);
Micron Technology, Inc., Boise, ID (US);
Abstract
A method of imaging and identifying defects and contamination on the surface of an integrated circuit is described. The method may be used on areas smaller than one micron in diameter. An energetic beam, such as an electron beam, is directed at a selected IC location having a layer of a solid, fluid or gaseous reactive material formed over the surface. The energetic beam disassociates the reactive material in the region into chemical radicals that either chemically etch the surface preferentially, or deposit a thin layer of a conductive material over the local area around the energetic beam. The surface may be examined as various layers are selectively etched to decorate defects and/or as various layers are locally deposited in the area around the energetic beam. SEM imaging and other analytic methods may be used to identify the problem more easily.