The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 07, 2010

Filed:

Apr. 06, 2005
Applicants:

Takahiro Kishioka, Toyama, JP;

Rikimaru Sakamoto, Toyama, JP;

Yoshiomi Hiroi, Toyama, JP;

Daisuke Maruyama, Toyama, JP;

Inventors:

Takahiro Kishioka, Toyama, JP;

Rikimaru Sakamoto, Toyama, JP;

Yoshiomi Hiroi, Toyama, JP;

Daisuke Maruyama, Toyama, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/11 (2006.01); C08L 79/04 (2006.01); C09D 163/00 (2006.01); C09D 179/04 (2006.01); H01L 21/027 (2006.01);
U.S. Cl.
CPC ...
Abstract

There is provided an anti-reflective coating forming composition comprising a polymer having a pyrimidinetrione structure, imidazolidinedione structure, imidazolidinetrione structure or triazinetrione structure and a solvent. The anti-reflective coating obtained from the composition has a high preventive effect for reflected light, causes no intermixing with photoresists, and can use in lithography process by use of a light having a short wavelength such as ArF excimer laser beam (wavelength 193 nm) or F2 excimer laser beam (wavelength 157 nm), etc.


Find Patent Forward Citations

Kishioka, Takahiro. (2010). Condensation type polymer-containing anti-reflective coating for semiconductor (U.S. Patent No. 7790356). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7790356

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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