The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 07, 2010
Filed:
Jun. 25, 2009
Hideo Shite, Kikuchi-gun, JP;
Hideo Shite, Kikuchi-gun, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
The resist coating unit (COT) has a spin chuck () which holds the wafer to be supplied with a resist liquid, and a process cup () which accommodates the spin chuck () and exhaustes an atmosphere around the wafer W from a bottom thereof. The process cup () comprises a first cup () with an outer circumferential wall (), and an airflow control member () laid out close to the wafer W in the first cup () in such a manner as to surround the wafer W. The airflow control member () has a vertical cross section of an approximately rectangular shape defined by the upper ring portion () having a cross section of an approximately triangular shape and protruding upward, and a lower ring portion () having a cross section of an approximately triangular shape and protruding downward. An exhaust passage () for substantially exhausting the atmosphere around the wafer W is formed between the outer circumferential wall () and the airflow control member ().