The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 07, 2010
Filed:
Oct. 31, 2007
Yan Wang, Sunnyvale, CA (US);
Antoine P. Manens, Mountain View, CA (US);
Siew S. Neo, Santa Clara, CA (US);
Alain Duboust, Sunnyvale, CA (US);
Liang-yuh Chen, Foster City, CA (US);
Yan Wang, Sunnyvale, CA (US);
Antoine P. Manens, Mountain View, CA (US);
Siew S. Neo, Santa Clara, CA (US);
Alain Duboust, Sunnyvale, CA (US);
Liang-Yuh Chen, Foster City, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
Method for process control of electro-processes is provided. In one embodiment, the method includes processing a conductive layer formed on a wafer using a target endpoint, detecting breakthrough of the conductive layer to expose portions of an underlying layer, and adjusting the target endpoint in response to the detected breakthrough. In another embodiment, the target endpoint is adjusted relative to an amount of underlying layer exposed through the conductive layer.