The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 07, 2010
Filed:
Apr. 16, 2008
Nobuaki Matsuoka, Koshi, JP;
Takahiro Hashimoto, Koshi, JP;
Katsuhiro Tsuchiya, Tokyo-To, JP;
Shinichi Hayashi, Koshi, JP;
Yasushi Hayashida, Koshi, JP;
Nobuaki Matsuoka, Koshi, JP;
Takahiro Hashimoto, Koshi, JP;
Katsuhiro Tsuchiya, Tokyo-To, JP;
Shinichi Hayashi, Koshi, JP;
Yasushi Hayashida, Koshi, JP;
Tokyo Electron Limited, Tokyo-To, JP;
Abstract
A coating and developing system that includes two rotating members having parallel horizontal axes of rotation and disposed longitudinally opposite to each other, a carrying passage forming mechanism extended between the rotating members to form a carrying passage, and capable of moving along an orbital path to carry a wafer supported thereon, a sending-in transfer unit disposed at the upstream end of the carrying passage, a sending-out transfer unit disposed at the downstream end of the carrying passage, a developer pouring nozzle for pouring a developer onto the wafer, a cleaning nozzle for pouring a cleaning liquid onto the wafer, and a gas nozzle for blowing a gas against the wafer. The developer pouring nozzle, the cleaning nozzle, and the gas nozzle are arranged in a direction in which the wafer is carried along the carrying passage between the upstream and the downstream end of the carrying passage.