The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 31, 2010
Filed:
Nov. 08, 2007
Masayuki Kimura, Tokyo, JP;
Hiroshi Yokoyama, Tsukuba, JP;
Masayuki Kimura, Tokyo, JP;
Hiroshi Yokoyama, Tsukuba, JP;
JSR Corporation, Tokyo, JP;
National Institute of Advanced Industrial Science and Technology, Tokyo, JP;
Abstract
An optical alignment method which develops a pretilt angle by batch plane exposure without tilting a substrate. This optical alignment method provides liquid crystal aligning capability to the surface of a polymer film by exposing the surface of the polymer film through a slit exposure mask while the surface of the polymer film and the slit exposure mask are moved relative to each other substantially at a fixed rate. Alternatively, liquid crystal aligning capability is provided to the surface of the polymer film by exposing the surface of the polymer film through an optical exposure pattern while the optical exposure pattern having a plurality of lines with a certain width at certain intervals is formed on the surface of the polymer film continuously.