The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 31, 2010

Filed:

Aug. 25, 2006
Applicants:

Taisuke Furukawa, Tokyo, JP;

Hiroshi Kobayashi, Tokyo, JP;

Takashi Takenaga, Tokyo, JP;

Takeharu Kuroiwa, Tokyo, JP;

Sadeh Beysen, Tokyo, JP;

Masakazu Taki, Tokyo, JP;

Inventors:

Taisuke Furukawa, Tokyo, JP;

Hiroshi Kobayashi, Tokyo, JP;

Takashi Takenaga, Tokyo, JP;

Takeharu Kuroiwa, Tokyo, JP;

Sadeh Beysen, Tokyo, JP;

Masakazu Taki, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01B 7/30 (2006.01);
U.S. Cl.
CPC ...
Abstract

A magnetic field detection apparatus capable of changing the detection range and detection sensitivity as desired for a specific application is disclosed. A magnetoresistance effect element is applied a bias magnetic field and an external magnetic field. The bias magnetic field and the external magnetic field are generated on the same straight line, and therefore the bias magnetic field functions to hamper the external magnetic field applied to the magnetoresistance effect element. Thus, the magnetization of the free layer of the magnetoresistance effect element is suppressed, and the rotational angle of the magnetized vector is reduced. As a result, the characteristic of the resistance value of the magnetoresistance effect element to the external magnetic field is shifted by an amount equivalent to the bias magnetic field.


Find Patent Forward Citations

Loading…